Product Specification
ARISTOCRATE NICKEL BRIGHTNER – 009 V/B
BETTER PERFORMANCE BRIGHT NICKEL PROCESS.
Aristocrate Nickel Process is a better performance process developed to produce superior Leveled, Ductile, Brilliant deposits or mirror finish with uniform brightness at medium and low current density area, acceptable coverage and better Chrome receptivity.
The Process employs two addition agents namely Aristocrate Nickel Brightner 009V/B and additive 022/502/622. Both the addition agents are required for initial bath make up and for replenishing primary and secondary brightner components during working of the bath solution. The process gives excellent performance over a wide range of operating bath concentration, Temperature, Current densities etc. And can be used for either rack or barrel plating application with air or mechanical agitation.
The process is used for decorative plating either for a single layer Bright Nickel or as the top layer over Semibright Nickel for improved corrosion resistance. This process can be used on different base metals such as M.S. Copper, Semibright Nickel and on Brass, Zinc and Zinc Alloys components with a previous copper plating from a Cyanide based process while on Aluminum and Aluminum Alloys after suitable pretreatment followed by Zincating and Cyanide Copper plating.
SALIENT FEATURES :
1. Faster rate of brightening provides desired finish with less thickness of the deposits.
2. Produce extremely good leveling resulting in shorter plating time and fewer polishing operations.
3. Excellent low current density brightness and coverage.
4. Excellent deposit ductility and Chrome receptivity.
5. Good tolerance to metallic impurities.
BATH MAKE-UP :
RANGE OPTIMUM
Aristocrate Bright Nickel Salt – 531 R gm/lit. 200-400 325
Aristocrate Bright Nickel Additive-022/502/622 gm/lit (Vat) 6.0-10.0 8.0
(Barrel) 4.0 “ 8.0 6.0
Aristocrate Nickel brightner “ 009 ( Vat) 0.4- 0.6 0.6
Aristocrate Nickel brightner-009 (Barrel) 0.2-0.6 0.4
WORKING CONDITIONS :
RANGE OPTIMUM
Density o Be 16-26 22
Temperature o C 40-60 50
PH (Electrometric) (Vat) 4.4-5.2 4.8
(Barrel) 4.0-4.8 4.4
Cathode Current Density (Vat)Amp/Sq.dm 2.0-8.0 4.0
(Barrel)Amp./Sq.dm 0.5-2.0 1.0
Anode Current Density (Vat) Amp/Sq.dm. 1.0-4.0 2.0
(Barrel)Amp./Sq.dm 0.5-2.0 1.0
Voltage (Vat) 4.0-12.0 5.5
(Barrel)Amp./Sq.dm. 8.0-16.0 12.0
Agitation Cathode Rod/Low Air
Pressur Air
Foltration continuous continuous
Rate of Deposition at
3 Amp./Sq.dm.per minute 0.50 Micron 0.58 Micron
BATH MAINTENANCE :
RANGE OPTIMUM
Nickel Metal gm/ltr. 43-70 61.0
Nickel Sulphate gm/ltr. 170-270 230.0
Nickel Chloride gm/ltr. 35-55 48.0
Boric Acid gm/ltr. 30-50 45.0
TABLE :-
NO. | PLATING QUANTITY | ADDED IN ML PER 1000 AMP/HR. | ||
Brightner 009 V/B | Additive 022/502/622 | Leveller 544/644 | ||
1. | Barrel Plating | 100-20050-100 | 200-300150-250 | –NOT REQUIRED |
2. | Low Thickness(4-10 Microns) | 100-15075-100 | 300-250200-250 | –NOT REQUIRED |
3. | Medium Thickness(12-15 Microns) | 75-125100-125 | 275-225200-250 | Preferable50-75 |
4. | Higher Thickness(Above 20 Microns) | 50-10080-100 | 200-250225-250 | Preferable35-50 |
Contact Us
Mahavir Estate, B/h. Shah Chembers,
Near C.T.M. Cross Lane,
Amraiwadi,
Ahmedabad-380 026.
(Gujarat) INDIA.
Phone: 00-91-79-25856971-72,
Fax: 00-91-79-25856976.
Mail: info@mahavirexpochem.com